Precise Blaze Angle Measurements of Lithographically Fabricated Silicon Immersion Gratings
Emily Lubar, Daniel T. Jaffe, Cynthia Brooks, Sierra Hickman, Michael, Gully-Santiago, Gregory Mace

TL;DR
This paper presents precise measurement techniques for silicon immersion grating blaze angles, combining microscopy, optical, and theoretical methods to optimize fabrication accuracy and improve spectrograph efficiency.
Contribution
It introduces multiple innovative methods for accurately measuring the blaze angles of lithographically fabricated silicon immersion gratings, enhancing fabrication precision.
Findings
SEM imaging achieves 0.5° precision
Optical measurement achieves 0.2° precision
Theoretical modeling aims for 0.1° precision
Abstract
Silicon immersion gratings and grisms enable compact, near-infrared spectrographs with high throughput. These instruments find use in ground-based efforts to characterize stellar and exoplanet atmospheres, and in space-based observatories. Our grating fabrication technique uses x-ray crystallography to orient silicon parts prior to cutting, followed by lithography and wet chemical etching to produce the blaze. This process takes advantage of the crystal structure and relative difference in etching rates between the (100) and (111) planes such that we can produce parts that have surface errors < {\lambda}/4. Previous measurements indicate that chemical etching can yield a final etched blaze that slightly differs from the orientation of the (111) plane. This difference can be corrected by the mechanical mount in the case of the immersion gratings, but doing so may compromise grating…
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