How Silicon and Boron Dopants Govern the Cryogenic Scintillation Properties of N-type GaAs
Stephen Derenzo, Edith Bourret, Christiane Frank-Rotsch, Stephen, Hanrahan, and Maurice Garcia-Sciveresa

TL;DR
This study investigates how silicon and boron dopant concentrations influence the cryogenic scintillation properties of n-type GaAs, revealing optimal doping ranges for efficient light emission suitable for dark matter detection.
Contribution
It is the first to systematically analyze the impact of silicon and boron doping levels on GaAs scintillation properties at cryogenic temperatures.
Findings
Higher free carrier densities increase radiative recombination rates.
Luminosity exceeds 70 photons/keV in several samples within optimal doping ranges.
Decay times decrease significantly with increased free carrier concentration.
Abstract
This paper is the first report describing how the concentrations of silicon and boron govern the cryogenic scintillation properties of n-type GaAs. It shows that valence band holes are promptly trapped on radiative centers and then combine radiatively with silicon donor band electrons at rates that increase with the density of free carriers. It also presents the range of silicon and boron concentrations needed for efficient light emission under X-ray excitation, which along with its low band gap and apparent absence of afterglow, make scintillating GaAs suitable for the detection of rare, low-energy electronic excitations from interacting dark matter particles. A total of 29 samples from four different suppliers were studied. Luminosities and timing responses were measured for the four principal emission bands centered at 860, 930, 1070, and 1335 nm, and for the total emissions.…
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