Plasma Switch-Based Technology for High-Speed and High-Power Impedance Tuning

TL;DR

This paper presents the first plasma-enabled RF matching network using gas discharge tube plasma cells for high-speed, high-power impedance tuning, demonstrating a proof-of-concept device with significant bandwidth and power handling capabilities.

Contribution

Introduces a novel plasma-based RF impedance tuner, showcasing its design, fabrication, measurement, and potential for rapid, high-power tuning in mobile applications.

Findings

27% bandwidth from 3 to 4 GHz

Power gain better than -2.5 dB at 50 W

Switching transients around 500 ns

Abstract

This paper introduces a new technology for a high-speed, high-power mobile form-factor tuner utilizing gas discharge tube plasma cells as switching components. To the best of our knowledge, this represents the first plasma-enabled RF matching network. Technology development is reviewed, the fabrication and measurement of a proof-of-concept switched stub impedance tuner are presented, and techniques for improvement are discussed. The proof-of-concept impedance tuner functions with a 27% bandwidth from 3 to almost 4 GHz and shows a power gain better than -2.5 dB across all switching state-frequency combinations at a 50 W input power level with spread coverage of the Smith chart. State change transient timing is measured to be on the order of 500 ns. This technology demonstration highlights the potential of miniaturized, rapidly-tunable, high-power, plasma-based RF devices.