Toward volume manufacturing of high-performance soft x-ray critical-angle transmission gratings

TL;DR

This paper reports advancements in the fabrication of high-performance soft x-ray critical-angle transmission gratings, enabling large-scale production for space-based spectroscopic missions with improved efficiency and resolution.

Contribution

Development of new patterning and fabrication processes for large-area CAT gratings suitable for volume manufacturing on 200 mm wafer tools.

Findings

Achieved diffraction efficiency of approximately 10,000 at 1.49 keV.

Demonstrated successful patterning using e-beam and projection lithography.

Predicted efficiency improvements with increased grating depth from 4 to 6 micrometers.

Abstract

High-resolution ($R = \lambda /\Delta \lambda > 2000$) x-ray absorption and emission line spectroscopy in the soft x-ray band is a crucial diagnostic for the exploration of the properties of ubiquitous warm and hot plasmas and their dynamics in the cosmic web, galaxy clusters, galaxy halos, intragalactic space, and star atmospheres. Soft x-ray grating spectroscopy with $R > 10{,}000$ has been demonstrated with critical-angle transmission (CAT) gratings. CAT gratings combine the relaxed alignment and temperature tolerances and low mass of transmission gratings with high diffraction efficiency blazed in high orders. They are an enabling technology for the proposed Arcus grating explorer and were selected for the Lynx design reference mission grating spectrometer instrument. Both Arcus and Lynx require the manufacture of hundreds to perhaps $\approx 2000$ large-area CAT gratings. We are developing new patterning and fabrication process sequences that are conducive to large-format volume processing on state-of-the-art 200 mm wafer tools. Recent x-ray tests on 200 nm-period gratings patterned using e-beam-written masks and 4x projection lithography in conjunction with silicon pore focusing optics demonstrated $R \approx 10^4$ at 1.49 keV. Extending the grating depth from 4 $\mu$m to 6 $\mu$m is predicted to lead to significant improvements in diffraction efficiency and is part of our current efforts using a combination of deep reactive-ion etching and wet etching in KOH solution. We describe our recent progress in grating fabrication and report our latest diffraction efficiency and modeling results.