Precision of silicon oxynitride refractive-index profile retrieval using optical characterization
V\'it Kancl\'i\v{r}, Jan V\'aclav\'ik, and Karel \v{Z}\'idek

TL;DR
This study evaluates the precision of optical methods in retrieving the gradient refractive index profile of silicon oxynitride layers, revealing that multiple profiles can fit the data well despite differences in index values.
Contribution
It introduces a comprehensive fitting approach combining multiple optical characterization techniques to accurately determine the refractive index profile of gradient layers.
Findings
Multiple index profiles can fit the data with high accuracy.
The index value can differ by up to 0.02 from the mean without affecting fit quality.
Sensitivity analysis shows broad tolerance in profile shape fitting.
Abstract
Layers with gradient refractive-index profile are an attractive alternative to conventional homogeneous stack coatings. However, the optical characterization and monitoring of the graded refractive-index profile is a complex issue, which has been typically solved by using a simplified model of mixed materials. Although this approach provides a solution to the problem, the precision, which can be expected from optical characterization of the refractive index gradient, remains unclear. In this work, we study optical characterization of SiO_xN_y layers deposited via reactive dual ion beam sputtering. To characterize the deposited layers, we use several methods including reflectance, and transmittance spectra at a broad range of incident angles, together with spectral ellipsometry. All the data were simultaneously fitted with a general profile of refractive index. The expected profile used…
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