Sub-60 mV/decade switching in a metal-insulator-metal-insulator-semiconductor transistor without ferroelectric component
Peng Wu, Joerg Appenzeller

TL;DR
This study demonstrates sub-60 mV/decade switching in a WS2 MIMIS transistor without ferroelectric materials, attributing the steep slope to internal gate dynamics rather than ferroelectric effects, thus questioning the interpretation of such switching.
Contribution
It reveals that sub-60 mV/decade switching can occur due to internal gate effects in non-ferroelectric devices, challenging the assumption that such switching indicates ferroelectricity or true steep-slope behavior.
Findings
Sub-60 mV/decade switching observed without ferroelectric components.
Internal gate voltage response explains the steep-slope behavior.
Measurement artifacts can mimic steep-slope switching.
Abstract
Negative capacitance field-effect transistors (NC-FETs) have attracted wide interest as promising candidates for steep-slope devices, and sub-60 mV/decade switching has been demonstrated in NC-FETs with various device structures and material systems. However, the detailed mechanisms of the observed steep-slope switching in some of these experiments are under intense debate. Here we show that sub-60 mV/decade switching can be observed in a WS2 transistor with a metal-insulator-metal-insulator-semiconductor (MIMIS) structure - without any ferroelectric component. This structure resembles an NC-FET with internal gate, except that the ferroelectric layer is replaced by a leaky dielectric layer. Through simulations of the charging dynamics during the device characterization using an RC network model, we show that the observed steep-slope switching in our "ferroelectric-free" transistors can…
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Taxonomy
TopicsFerroelectric and Negative Capacitance Devices · Advanced Memory and Neural Computing · Semiconductor materials and devices
