Particle lofting from substrate exposed to plasma and electron beam
P. V. Krainov (1, 2), V. V. Ivanov (1), D. I. Astakhov (3, 1),, V. V. Medvedev (1, 2), V. V. Kvon (4), A. M. Yakunin (4), M. A. van de, Kerkhof (4) ((1) Institute for Spectroscopy of the Russian Academy of, Sciences, Troitsk, Moscow, Russia, (2) Moscow Institute of Physics and

TL;DR
This study uses particle-in-cell simulations to investigate how nanometer-sized dielectric particles are lofted from substrates under plasma and electron beam exposure, relevant for dust mitigation and lunar exploration.
Contribution
It introduces a simulation-based analysis of particle lofting caused by plasma and electron fluxes, providing insights into dust levitation mechanisms.
Findings
Particle lofting occurs under combined plasma and electron fluxes.
Simulation results help explain dust levitation phenomena.
Insights applicable to semiconductor and lunar dust mitigation.
Abstract
A nanometer-sized dielectric particle lying on a dielectric substrate is exposed to the flux of low-energy electrons, ion and electron fluxes from a cold plasma and the fluxes from the combination of these two sources with the help of particle-in-cell simulation to investigate the particle lofting phenomenon. The results are of interest for dust mitigation in the semiconductor industry, the lunar exploration, and the explanation of the dust levitation.
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Taxonomy
TopicsDust and Plasma Wave Phenomena · Laser-induced spectroscopy and plasma · Ion-surface interactions and analysis
