Electron Beam Formation and its Effect in Novel Plasma-optical Device for Evaporation of Micro-droplets in Cathode ARC Plasma Coating

TL;DR

This paper investigates how a self-generated electron beam in a plasma-optical device enhances micro-droplet evaporation in cathode arc plasma coating by transferring energy through a specialized electron flow.

Contribution

It introduces a novel mechanism of electron beam formation near the cylindrical surface that improves evaporation efficiency in plasma coating systems.

Findings

Electron beam forms via secondary emission at the cylindrical surface.

The beam accelerates due to electric potential jumps in magnetic fields.

High-energy electrons effectively evaporate micro-droplets during plasma flow.

Abstract

The additional pumping of energy into arc plasma flow by the self-consistently formed radially directed beam of high-energy electrons for evaporation of micro-droplets is considered. The radial beam appears near the inner cylindrical surface by secondary ion - electron emission at this surface bombardment by peripheral arc plasma flow ions. The beam is accelerated by electric potential jump, appeared in a cylindrical channel of the plasma-optical system in crossed radial electrical and longitudinal magnetic fields. The high-energy electrons pump, during the time of micro-droplet movement through the system, the energy, which is sufficient for evaporation of micro-droplets.