Double electric layer influence on dynamic of EUV radiation from plasma of high-current pulse diode in tin vapor

TL;DR

This paper investigates how the double electric layer affects the behavior of EUV radiation from high-current tin plasma discharges, revealing that plasma heating in the double layer enhances radiation power.

Contribution

It provides new insights into the role of the double electric layer in plasma dynamics and EUV radiation generation in high-current pulse diodes.

Findings

Double layer influences electric potential distribution.

Plasma heating in the double layer increases radiation pulses.

Enhanced radiation power due to double layer effects.

Abstract

Generation of high-power pulses of extreme ultraviolet radiation from multi-charged tin plasma are of great interest to many applications. We studied the electric potential distribution in the discharge gap in kind formed double layer. The local plasma heating by electron beam, formed in the double layer, leads to generation of peak radiation pulses and as a result to an increase in the radiation power.