Voltage tunable quantum dot array by patterned Ge-nanowire based metal-oxide-semiconductor (MOS) devices
Subhrajit Sikdar, Basudev Nag Chowdhury, Rajib Saha, Sanatan, Chattopadhyay

TL;DR
This paper demonstrates a scalable, room-temperature voltage-tunable quantum dot array using patterned Ge-nanowire MOS devices, enabling control over quantum states for advanced quantum and electronic applications.
Contribution
It introduces a novel fabrication of Ge-nanowire based MOS devices that function as voltage-tunable quantum dots at room temperature, with detailed experimental and theoretical analysis.
Findings
Quantum confinement confirmed by step-like C-V responses.
Quantum states occupy approximately 6 electronic charges.
Device modeling aligns with experimental transport data.
Abstract
Semiconductor quantum dots (QDs) are being regarded as the primary unit for a wide range of advanced and emerging technologies including electronics, optoelectronics, photovoltaics and biosensing applications as well as the domain of q-bits based quantum information processing. Such QDs are suitable for several novel device applications for their unique property of confining carriers 3-dimensionally creating discrete quantum states. However, the realization of such QDs in practice exhibits serious challenge regarding their fabrication in array with desired scalability and repeatability as well as control over the quantum states at room temperature. In this context, the current work reports the fabrication of an array of highly scaled Ge-nanowire (radius ~25 nm) based vertical metal-oxide-semiconductor devices that can operate as voltage tunable quantum dots at room temperature. The…
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