Effects of substrate-surface reconstruction and orientation on spin-valley polarization in MoTe$_2$/EuO
Ao Zhang, Zisheng Gong, Ziming Zhu, Anlian Pan, and Mingxing Chen

TL;DR
This study examines how substrate surface reconstruction and orientation influence spin-valley polarization in MoTe$_2$ monolayers on EuO, revealing that interface details significantly affect valley polarization strength.
Contribution
It provides first-principles insights into how surface reconstruction and orientation of EuO substrates modulate spin-valley polarization in MoTe$_2$, highlighting the importance of interface structure.
Findings
Valley polarization varies from a few meV to 40 meV depending on interface details.
Reconstructed EuO(111) shows weaker valley polarization compared to ideal EuO(111).
EuO(001) induces a stable valley polarization of about 3.2 meV.
Abstract
We investigate the spin-valley polarization in MoTe monolayer on (111) and (001) surfaces of ferromagnetic semiconductor EuO based on first-principles calculations. We consider surface reconstructions for EuO(111). We find that there is no direct chemical bonding between the reconstructed EuO(111) and the MoTe overlayer, in contrast to the case of the ideal EuO(111). However, there is a strong hybridization between the states of MoTe and the substrate states, which has a substantial impact on the valleys. The valley polarization due to the magnetic proximity effect is dependent on the detail of the interface structure, which is in the range of a few meV to about 40 meV. These values are at least one order of magnitude smaller than that induced by the ideal EuO(111). When the MoTe monolayer is interfaced with EuO(001), the valley polarization is about 3.2 meV, insensitive…
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