Low-loss integrated nanophotonic circuits with layered semiconductor materials
Tianyi Liu, Ioannis Paradisanos, Jijun He, Alisson R. Cadore, Junqiu, Liu, Mikhail Churaev, Rui Ning Wang, Arslan S. Raja, Cl\'ement Javerzac-Galy,, Philippe R\"olli, Domenico De Fazio, Barbara L. T. Rosa, Sefaattin Tongay,, Giancarlo Soavi, Andrea C. Ferrari

TL;DR
This paper demonstrates a low-loss integrated nanophotonic platform combining monolayer MoTe2 with silicon nitride microresonators, achieving high quality factors suitable for advanced photonic applications.
Contribution
It introduces a novel hybrid platform integrating monolayer MoTe2 with Si3N4 photonics, maintaining high Q-factors without wafer bonding.
Findings
Microresonator Q-factors exceed 3 million in telecom bands
Optical loss due to MoTe2 is minimal outside excitonic regions
Dispersion and resonance shifts are characterized with MoTe2 integration
Abstract
Monolayer transition metal dichalcogenides with direct bandgaps are emerging candidates for microelectronics, nano-photonics, and optoelectronics. Transferred onto photonic integrated circuits (PICs), these semiconductor materials have enabled new classes of light-emitting diodes, modulators and photodetectors, that could be amenable to wafer-scale manufacturing. For integrated photonic devices, the optical losses of the PICs are critical. In contrast to silicon, silicon nitride (Si3N4) has emerged as a low-loss integrated platform with a wide transparency window from ultraviolet to mid-infrared and absence of two-photon absorption at telecommunication bands. Moreover, it is suitable for nonlinear integrated photonics due to its high Kerr nonlinearity and high-power handing capability. These features of Si3N4 are intrinsically beneficial for nanophotonics and optoelectronics…
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