Understanding Cu Incorporation in the $\mathrm{Cu_{2x}Hg_{2-x}GeTe_4}$ Structure using Resonant X-ray Diffraction
Ben L. Levy-Wendt, Brenden R. Ortiz, L\`idia C. Gomes, Kevin H. Stone,, Donata Passarello, Elif Ertekin, Eric S. Toberer, and Michael F. Toney

TL;DR
This study combines resonant X-ray diffraction and DFT calculations to reveal how Cu incorporates into the Cu-Hg-Ge-Te alloy, showing that Cu substitutes for Hg and influences carrier concentration through anti-site defects, aiding thermoelectric material design.
Contribution
It provides the first detailed understanding of Cu incorporation mechanisms and their impact on carrier concentration in Cu-Hg-Ge-Te alloys using combined experimental and theoretical methods.
Findings
Cu substitutes for Hg at a 2:1 ratio
Cu incorporation occurs on specific crystallographic planes
Cu-Hg anti-site defects correlate with hole concentration
Abstract
The ability to control carrier concentration based on the extent of Cu solubility in the alloy compound (where 0 x 1) makes an interesting case study in the field of thermoelectrics. While Cu clearly plays a role in this process, it is unknown exactly how Cu incorporates into the crystal structure and how this affects the carrier concentration. In this work, we use a combination of resonant energy X-ray diffraction (REXD) experiments and density functional theory (DFT) calculations to elucidate the nature of Cu incorporation into the structure. REXD across the edge facilitates the characterization of Cu incorporation in the alloy and enables direct quantification of anti-site defects. We find…
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