Soft x-ray irradiation induced metallization of layered TiNCl
Noriyuki Kataoka, Masashi Tanaka, Wataru Hosoda, Takumi Taniguchi,, Shin-ichi Fujimori, Takanori Wakita, Yuji Muraoka, and Takayoshi Yokoya
TL;DR
This study demonstrates that soft x-ray irradiation induces metallization in layered TiNCl by causing Cl desorption, offering a new method to control its electrical properties through photo-induced deintercalation.
Contribution
It reveals that photoirradiation causes Cl desorption leading to metallization in TiNCl, introducing a novel carrier doping technique.
Findings
Increased states near Fermi level under irradiation
Confirmation of Ti 3d character at Fermi edge
Metallization due to Cl desorption
Abstract
We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.
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