Laser-microstructured ZnO/p-Si photodetector with enhanced and broadband responsivity across the UV-Vis-NIR
Georgios Chatzigiannakis, Angelina Jaros, Renaud Leturcq, J\"orgen, Jungclaus, Tobias Voss, Spyros Gardelis, Maria Kandyla

TL;DR
This paper presents a novel ZnO/p-Si photodetector with laser-microstructured silicon that exhibits high sensitivity and broadband responsivity across UV, visible, and near-infrared wavelengths, achieved through atomic layer deposition and surface microstructuring.
Contribution
The study introduces a laser-microstructured silicon substrate combined with ALD-deposited ZnO, resulting in enhanced broadband photodetector performance with high crystalline quality and increased surface area.
Findings
Enhanced responsivity across UV-Vis-NIR spectrum.
Higher photocurrent in microstructured devices compared to planar.
Photodetectors operate effectively even below silicon bandgap.
Abstract
We develop ZnO/p-Si photodetectors by atomic layer deposition (ALD) of ZnO thin films on laser-microstructured silicon and we investigate their electrical and optical behavior, demonstrating high sensitivity and broadband operation. Microstructured p-type silicon was obtained by ns-laser irradiation in SF6 gas, which results in the formation of quasi-ordered and uniform microspikes on the silicon surface. The irradiated silicon contains sulfur impurities, which extend its absorbance to the near infrared. A thin film of ZnO was conformally deposited on the microstructured silicon substrates by ALD. Photoluminescence measurements indicate high crystalline quality of the ZnO film after annealing. Current-voltage (I-V) measurements of the ZnO/p-Si heterodiodes in dark show a non-linear behavior with unusual high current values in reverse bias. Under illumination photocurrent is observed for…
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