Growth of a textured quasicrystalline phase in Ti-Ni-Zr films prepared by pulsed laser deposition

TL;DR

This study demonstrates that pulsed laser deposition at 275°C can produce a textured, nanocrystalline quasicrystalline Ti-Ni-Zr film up to 1 micron thick on sapphire substrates, with detailed structural and compositional analysis.

Contribution

It is the first to show the growth of a textured quasicrystalline phase in Ti-Ni-Zr thin films via pulsed laser deposition at a specific temperature.

Findings

Quasicrystalline phase forms at 275°C

Films are up to 1 micron thick

Structural and compositional analyses confirm phase formation

Abstract

The preparation in thin film form of the known icosahedral phase in Ti-Ni-Zr bulk alloys has been investigated as a function of substrate temperature. Films were deposited by Pulsed Laser Deposition on sapphire substrates at temperatures ranging from room temperature to 350$^\circ$C. Morphological and structural modifications have been followed by grazing incidence and $\theta$-2$\theta$ X-ray diffraction, transmission electron diffraction and imaging. Chemical composition has been analysed by Electron Probe Micro-Analysis. The in-depth variation of composition has been studied by Secondary Neutral Mass Spectroscopy. We show that Pulsed Laser Deposition at 275$^\circ$C makes the formation of a 1 m thick film of Ti-Ni-Zr quasicrystalline textured nanocrystallites possible.