Optical imaging of strain-mediated phase coexistence during electrothermal switching in a Mott insulator
Matthias Lange, Stefan Gu\'enon, Yoav Kalcheim, Theodor Luibrand,, Nicolas Manuel Vargas, Dennis Schwebius, Reinhold Kleiner, Ivan K. Schuller,, Dieter Koelle

TL;DR
This study visualizes and analyzes the electrothermal resistive switching in V₂O₃ thin films, revealing the role of strain-induced heterogeneity and phase separation in the switching dynamics using microscopy and modeling.
Contribution
It provides direct optical visualization of strain-mediated phase coexistence during electrothermal switching in a Mott insulator, linking structural heterogeneity to switching behavior.
Findings
Reversible resistive switching visualized with high-resolution microscopy.
Formation of narrow metallic filaments during switching.
Heterogeneity and strain influence switching dynamics and filament morphology.
Abstract
Resistive-switching -- the current-/voltage-induced electrical resistance change -- is at the core of memristive devices, which play an essential role in the emerging field of neuromorphic computing. This study is about resistive switching in a Mott-insulator, which undergoes a thermally driven metal-to-insulator transition. Two distinct switching mechanisms were reported for such a system: electric-field-driven resistive switching and electrothermal resistive switching. The latter results from an instability caused by Joule heating. Here, we present the visualization of the reversible resistive switching in a planar VO thin-film device using high-resolution wide-field microscopy in combination with electric transport measurements. We investigate the interaction of the electrothermal instability with the strain-induced spontaneous phase-separation in the VO thin film at…
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Taxonomy
TopicsAdvanced Memory and Neural Computing · Transition Metal Oxide Nanomaterials · Neural dynamics and brain function
