Determination of the light exposure on the photodiodes of a new instrumented baffle for the Virgo input mode cleaner end-mirror
A. Romero, A. Allocca, A. Chiummo, M. Martinez, Ll.M. Mir, H. Yamamoto

TL;DR
This paper simulates light distribution on a new instrumented baffle for the Virgo interferometer to assess photodiode exposure, aiding in the upgrade of the input mode cleaner system.
Contribution
It introduces detailed simulation methods to evaluate light exposure on photodiodes in a new baffle design for the Virgo interferometer.
Findings
Simulated light exposure levels under various operational scenarios.
Validation of the baffle's photodiode placement for optimal light detection.
Guidelines for future baffle design improvements.
Abstract
As part of the upgrade program of the Advanced Virgo interferometer, the installation of new instrumented baffles surrounding the main test masses is foreseen. As a demonstrator, and to validate the technology, the existing baffle in the area of the input mode cleaner end-mirror will be first replaced by a baffle equipped with photodiodes. This paper presents detailed simulations of the light distribution on the input mode cleaner baffle, with the aim to determine the light exposure of the photodiodes under different scenarios of the interferometer operation.
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Taxonomy
TopicsMagneto-Optical Properties and Applications · Advanced Fiber Optic Sensors · Optical Systems and Laser Technology
