Comprehensive studies on steady-state and transient electronic transport in In0.52Al0.48As
Anup Kumar Mandia, Bhaskaran Muralidharan, Seung Cheol Lee and, Satadeep Bhattacharjee

TL;DR
This paper provides a detailed simulation-based analysis of steady-state and transient electronic transport in In0.52Al0.48As, revealing how transient effects influence device performance and cut-off frequencies at nanometer scales.
Contribution
It offers a comprehensive characterization of electronic transport parameters and transient effects in In0.52Al0.48As, aiding optimized device design for high-frequency applications.
Findings
Transient effects are significant for device lengths under 700 nm.
Including transient effects increases the estimated cut-off frequency from 261 GHz to 663 GHz at 100 nm scale.
All key transport parameters are rigorously extracted and characterized.
Abstract
High electron mobility transistors (HEMT) built using In\textsubscript{0.52}Al\textsubscript{0.48}As/In\textsubscript{0.53}Ga\textsubscript{0.47}As on InP substrates are a focus of considerable experimental studies due to their favourable performance for microwave, optical and digital applications. We present a detailed and comprehensive study of steady state and transient electronic transport in In\textsubscript{0.52}Al\textsubscript{0.48}As with the three valley model using the semi-classical ensemble Monte Carlo method and including all important scattering mechanisms. All electronic transport parameters such drift velocity, valley occupation, average electron energy, ionization coefficient and generation rate, electron effective mass, diffusion coefficient, energy and momentum relaxation time are extracted rigorously from the simulations. Using these, we present a complete…
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