Thermal Stability of Hafnium Zirconium Oxide on Transition Metal Dichalcogenides
Maria Gabriela Sales, Samantha T. Jaszewski, Shelby S. Fields, Jon F., Ihlefeld, Stephen J. McDonnell

TL;DR
This study investigates the thermal stability of hafnium zirconium oxide interfaces with transition metal dichalcogenides, revealing stability depends on surface functionalization and annealing conditions, with implications for ferroelectric device fabrication.
Contribution
It provides new insights into how functionalization and annealing affect the stability and crystallization of HZO on TMDCs, advancing understanding for ferroelectric device integration.
Findings
HZO on non-functionalized MoS2 is unstable upon annealing.
HZO on functionalized MoS2 remains stable between 400-800°C.
HZO/WSe2 interface stable until 700°C, then Se evolves.
Abstract
Ferroelectric oxides interfaced with transition metal dichalcogenides (TMDCs) offer a promising route toward ferroelectric-based devices due to lack of dangling bonds on the TMDC surface leading to a high-quality and abrupt ferroelectric/TMDC interface. In this work, the thermal stability of this interface is explored by first depositing hafnium zirconium oxide (HZO) directly on geological MoS2 and as-grown WSe2, followed by sequential annealing in ultra-high vacuum (UHV) over a range of temperatures (400-800 {\deg}C), and examining the interface through X-ray photoelectron spectroscopy (XPS). We show that the nucleation and stability of HZO grown through atomic layer deposition (ALD) varied depending on functionalization of the TMDC, and the deposition conditions can cause tungsten oxidation in WSe2. It was observed that HZO deposited on non-functionalized MoS2 was unstable and…
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