InSe Schottky diodes based on van der Waals contacts
Qinghua Zhao, Wanqi Jie, Tao Wang, Andres Castellanos-Gomez, Riccardo, Frisenda

TL;DR
This paper investigates high-quality van der Waals contacts for InSe-based Schottky diodes, demonstrating that stacking exfoliated InSe onto pre-patterned electrodes yields superior interfaces and device performance.
Contribution
It introduces a lithography-free method to create high-quality van der Waals contacts for InSe, improving device interfaces and performance compared to traditional metal deposition techniques.
Findings
Graphite-InSe contacts have negligible Schottky barrier due to similar electron affinity.
Au-InSe contacts form a significant Schottky barrier, affecting device behavior.
Van der Waals stacking yields cleaner, more effective metal-semiconductor interfaces.
Abstract
Two-dimensional semiconductors are excellent candidates for next-generation electronics and optoelec-tronics thanks to their electrical properties and strong light-matter interaction. To fabricate devices with optimal electrical properties, it is crucial to have both high-quality semiconducting crystals and ideal con-tacts at metal-semiconductor interfaces. Thanks to the mechanical exfoliation of van der Waals crystals, atomically-thin high-quality single-crystals can easily be obtained in a laboratory. However, conventional metal deposition techniques can introduce chemical disorder and metal-induced mid-gap states that induce Fermi level pinning and can degrade the metal-semiconductor interfaces, resulting in poorly performing devices. In this article, we explore the electrical contact characteristics of Au-InSe and graphite-InSe van der Waals contacts, obtained by stacking…
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