Statistics of adatom diffusion in a model of thin film growth
Edwin E. Mozo Luis, Ismael S. S. Carrasco, Thiago A. de Assis, F\'abio, D. A. Aar\~ao Reis

TL;DR
This study analyzes adatom hop statistics during thin film growth using the CV model, revealing different diffusion regimes, scaling laws, and distribution behaviors depending on temperature and surface conditions.
Contribution
It provides a detailed characterization of adatom diffusion statistics and their dependence on model parameters, introducing new scaling laws and distribution forms for different temperature regimes.
Findings
At low temperature, average hops scale as R^{0.38}
Distribution of hops decays as a stretched exponential at low temperature
High temperature regime shows exponential decay in hop distribution
Abstract
We study the statistics of the number of executed hops of adatoms at the surface of films grown with the Clarke-Vvedensky (CV) model in simple cubic lattices. The distributions of this number, , are determined in films with average thicknesses close to and monolayers for a broad range of values of the diffusion-to-deposition ratio and of the probability that lowers the diffusion coefficient for each lateral neighbor. The mobility of subsurface atoms and the energy barriers for crossing step edges are neglected. Simulations show that the adatoms execute uncorrelated diffusion during the time in which they move on the film surface. In a low temperature regime, typically with , the attachment to lateral neighbors is almost irreversible, the average number of hops scales as , and the distribution of…
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