Dynamics of Atomic Steps on GaN (0001) during Vapor Phase Epitaxy
Guangxu Ju, Dongwei Xu, Carol Thompson, Matthew J. Highland, Jeffrey, A. Eastman, Weronika Walkosz, Peter Zapol, and G. Brian Stephenson

TL;DR
This study uses surface X-ray scattering to distinguish the growth behaviors of A and B steps on GaN (0001), revealing that A steps have higher adatom attachment rates, advancing understanding of surface dynamics during vapor phase epitaxy.
Contribution
It demonstrates a novel application of surface X-ray scattering to differentiate A and B step dynamics on GaN (0001), providing quantitative kinetic parameters during growth.
Findings
Higher attachment rate constants at A steps compared to B steps.
Steady-state alpha terrace fraction increases with growth rate.
Surface dynamics are consistent with Burton-Cabrera-Frank model predictions.
Abstract
Images of the morphology of GaN (0001) surfaces often show half-unit-cell-height steps separating a sequence of terraces having alternating large and small widths. This can be explained by the stacking sequence of the wurtzite crystal structure, which results in steps with alternating and edge structures for the lowest energy step azimuths, i.e. steps normal to type directions. Predicted differences in the adatom attachment kinetics at and steps would lead to alternating and terrace widths. However, because of the difficulty of experimentally identifying which step is or , it has not been possible to determine the absolute difference in their behavior, e.g. which step has higher adatom attachment rate constants. Here we show that surface X-ray scattering can measure the fraction of and …
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsGaN-based semiconductor devices and materials · Semiconductor materials and devices · Ga2O3 and related materials
