Synthesis and structural analysis of Mo/B periodical multilayer X-ray mirrors for beyond extreme ultraviolet optics

TL;DR

This study synthesized Mo/B multilayer X-ray mirrors for BEUV optics, analyzing their structure and optical performance, and found they outperform traditional B4C-based mirrors, promising advancements in BEUV lithography.

Contribution

The paper presents a novel synthesis method for Mo/B multilayer mirrors and provides detailed structural analysis and optical performance predictions for BEUV applications.

Findings

Interlayers of molybdenum borides at interfaces

Low interface roughness of 0.3-0.4 nm

Reflectivity of ~49% at 6.7 nm wavelength

Abstract

The synthesis and structural analysis of Mo/B periodical multilayer X-ray mirrors (PMMs) for beyond extreme ultraviolet (BEUV) optics was performed. The PMMs were deposited by a combination of pulsed DC and radio frequency (RF) magnetron sputtering. The structure was analyzed by high-resolution transmission electron microscopy, X-ray photoelectron spectroscopy, and grazing incidence X-ray reflectometry. The formation of 0.35 nm-thick interlayers comprised of a mixture of molybdenum borides was observed at the Mo/B interfaces. Furthermore, a low interface roughness of 0.3-0.4 nm was reported. The temperature of the substrate increased due to the increase in the sputtering power. This resulted in an increase in the thickness of the interlayers and the interface roughness; subsequently, the optical properties of the PMM deteriorated. Theoretical calculations were performed based on the real structure of the PMM to predict the reflectivity at a working wavelength of 6.7 nm. The reflectivity of approximately 49% was two times higher than that of the conventional B4C-based BEUV mirrors. Based on our study results, it can be concluded that the as-synthesized PMMs will perform better than the traditional mirrors and can be effectively used for the development of the next generation of BEUV lithography.