Monitored wet-etch removal of individual dielectric layers from high-finesse Bragg mirrors
Simon Bernard, Thomas J. Clark, Vincent Dumont, Jiaxing Ma, Jack C., Sankey

TL;DR
This paper introduces a low-cost, monitored wet etch method for selectively removing dielectric layers from high-finesse Bragg mirrors, enabling precise control over optical properties without damaging the substrate.
Contribution
It presents a novel, single-step wet etch process with real-time monitoring for reliably removing specific dielectric layers from high-reflectivity fiber mirrors.
Findings
Successfully removed up to six bilayers with maintained optical quality
Achieved a stepwise decrease in finesse from 92,000 to 3,950
Produced a tapered fiber profile reducing diameter to ~100 μm
Abstract
It is prohibitively expensive to deposit customized dielectric coatings on individual optics. One solution is to batch-coat many optics with extra dielectric layers, then remove layers from individual optics as needed. Here we present a low-cost, single-step, monitored wet etch technique for reliably removing (or partially removing) individual SiO and TaO dielectric layers, in this case from a high-reflectivity fiber mirror. By immersing in acid and monitoring off-band reflected light, we show it is straightforward to iteratively (or continuously) remove six bilayers. At each stage, we characterize the coating performance with a Fabry-P\'{e}rot cavity, observing the expected stepwise decrease in finesse from 92,0003,000 to 3,95050, finding no evidence of added optical losses. The etch also removes the fiber's sidewall coating after a single bilayer, and, after six…
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