Comparison of different methods of nitrogen-vacancy layer formation in diamond for widefield quantum microscopy
A. J. Healey, A. Stacey, B. C. Johnson, D. A. Broadway, T. Teraji, D., A. Simpson, J.-P. Tetienne, L. C. L. Hollenberg

TL;DR
This study compares three methods for creating nitrogen-vacancy layers in diamond for widefield magnetic microscopy, evaluating their sensitivities, strain effects, and practical considerations at room and cryogenic temperatures.
Contribution
It provides the first direct experimental comparison of NV layer fabrication methods, highlighting the effectiveness of low-energy irradiation of HPHT diamond as a cost-effective approach.
Findings
HPHT and δ-doped samples achieve similar magnetic sensitivities within a factor of 2.
N$^+$ and CN$^-$ implanted samples have 2-5 times worse sensitivity.
Low-energy irradiation of HPHT diamond is a competitive, simple, and low-cost method.
Abstract
Thin layers of near-surface nitrogen-vacancy (NV) defects in diamond substrates are the workhorse of NV-based widefield magnetic microscopy, which has applications in physics, geology and biology. Several methods exist to create such NV layers, which generally involve incorporating nitrogen atoms (N) and vacancies (V) into the diamond through growth and/or irradiation. While there have been detailed studies of individual methods, a direct side-by-side experimental comparison of the resulting magnetic sensitivities is still missing. Here we characterise, at room and cryogenic temperatures, nm thick NV layers fabricated via three different methods: 1) low-energy carbon irradiation of N-rich high-pressure high-temperature (HPHT) diamond, 2) carbon irradiation of -doped chemical vapour deposition (CVD) diamond, 3) low-energy N or CN implantation into N-free CVD…
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