Bias Dependent Variability of Low Frequency Noise in Single Layer Graphene FETs
Nikolaos Mavredakis, Ramon Garcia Cortadella, Xavi Illa, Nathan, Schaefer, Andrea Bonaccini Calia, Anton Guimera-Brunet, Jose Antonio Garrido, and David Jimenez

TL;DR
This study investigates the bias-dependent variability of low-frequency noise in single-layer graphene FETs, providing a physics-based model validated by experiments, revealing the physical mechanisms behind noise fluctuations.
Contribution
It introduces the first comprehensive statistical analysis and analytical model of LFN variability in GFETs, linking physical mechanisms to noise deviations under various bias conditions.
Findings
LFN variability is driven by carrier number fluctuations and mobility fluctuations.
LFN deviations follow an M-shape versus gate bias, with a minimum at the charge neutrality point.
Trap statistics in GFETs differ from classical Poisson distribution, likely due to electrolyte interface effects.
Abstract
Low-frequency noise (LFN) variability in graphene transistors (GFETs) is for the first time researched in this work. LFN from an adequate statistical sample of long-channel solution-gated single-layer GFETs is measured in a wide range of operating conditions while a physics-based analytical model is derived that accounts for the bias dependence of LFN variance with remarkable performance. It is theoretically proved and experimentally validated that LFN deviations in GFETs stem from physical mechanisms that generate LFN. Thus, carrier number DN due to trapping/detrapping process and mobility fluctuations Dm which are the main causes of LFN, define its variability likewise as its mean value. DN accounts for an M-shape of normalized LFN variance versus gate bias with a minimum at the charge neutrality point (CNP) as it was the case for normalized LFN mean value while Dm contributes only…
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