Internal quantum efficiency of AlGaN/AlN quantum dot superlattices for electron-pumped ultraviolet sources
A. Harikumar, F. Donatini, C. Bougerol, E. Bellet-Amalric, Q.-M. Thai,, C. Dujardin, I. Dimkou, S. T. Purcell, E. Monroy

TL;DR
This study investigates the growth, optical properties, and efficiency of AlGaN/AlN quantum dot superlattices for ultraviolet light sources, demonstrating stable internal quantum efficiency up to 50% under high injection conditions.
Contribution
It presents the first demonstration of stable high internal quantum efficiency in AlGaN/AlN quantum dot superlattices across a wide range of injection levels.
Findings
Quantum dot layers exhibit high density (>10^11 cm^-2) and stable emission efficiency.
Emission efficiency remains constant below 9 kV electron acceleration voltage.
Internal quantum efficiency around 50% at high injection levels for III/V ratio < 0.75.
Abstract
In this paper, we describe the growth and characterization of 530-nm-thick superlattices (100 periods) of AlxGa1-xN/AlN (x = 0, 0.1) Stranski-Krastanov quantum dots for application as the active region of electron-beam pumped ultraviolet lamps. Highly dense (>10e11 cm-2) quantum dot layers are deposited by molecular beam epitaxy, and we explore the effect of the III/V ratio during the growth process on their optical performance. The study considers structures emitting in the 244-335 nm range at room temperature, with a relative linewidth in the 6-11% range, mainly due to the QD diameter dispersion inherent in self-assembled growth. Under electron pumping, the emission efficiency remains constant for acceleration voltages below 9 kV. The correlation of this threshold with the total thickness of the superlattice and the penetration depth of the electron beam confirms the homogeneity of…
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