Optical and nanostructural insights of oblique angle deposited layers applied for photononic coatings
Florian Maudet, Bertrand Lacroix, Antonio J. Santos, Fabien Paumier,, Maxime Paraillous, Simon Hurand, Alan Corvisier, Cecile Marsal, Baptiste, Giroire, Cyril Dupeyrat, Rafael Garc\'ia, Francisco M. Morales, Thierry, Girardeau

TL;DR
This study investigates the nanostructure and optical properties of oblique angle deposited SiO2 layers, developing an optical model that links microstructure to optical response, enabling improved photonic coatings with high transmission.
Contribution
It introduces a comprehensive optical model that correlates nanostructural parameters with optical properties of oblique angle deposited layers, facilitating design of advanced photonic coatings.
Findings
Microstructural analysis reveals porosity gradient and nanocolumn aspect ratio.
Optical model accurately fits measured ellipsometry data.
Developed anti-reflective coating shows high transmission performance.
Abstract
Oblique angle deposition (OAD) is a nanostructuration method widely used to tune the optical properties of thin films. The introduction of porosity controlled by the deposition angle is used to develop the architecture of each layer and stack that enable modifying and optimizing the optical properties of the constituent layers for optimal design. However, optical properties of these nanostructured layers may differ greatly from those of dense layers due to the presence of anisotropy, refractive index gradient and scattering. This work focuses on OAD layers based on a reference photonic material such as SiO2 and it aims at taking into account all these effects in the description of the optical response. For that, the nanostructure has been analyzed with a complete SEM study and key parameters like the porosity gradient profile and aspect ratio of the nanocolumns were extracted. The…
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