Metal-to-insulator transition in Pt-doped TiSe$_2$ driven by emergent network of narrow transport channels
Kyungmin Lee, Jesse Choe, Davide Iaia, Juqiang Li, Junjing Zhao, Ming, Shi, Junzhang Ma, Mengyu Yao, Zhenyu Wang, Chien-Lung Huang, Masayuki Ochi,, Ryotaro Arita, Utpal Chatterjee, Emilia Morosan, Vidya Madhavan, Nandini, Trivedi

TL;DR
This paper reports a novel metal-insulator transition in Pt-doped TiSe2 driven by a network of narrow charge density wave domain walls, leading to a dramatic increase in resistivity and pseudogap features.
Contribution
It introduces an alternative MIT mechanism involving a network of narrow transport channels induced by Pt doping in TiSe2, distinct from traditional mechanisms.
Findings
Resistivity increases by five orders of magnitude with Pt doping.
Scanning tunneling microscopy reveals a network of charge density wave domain walls.
Pseudogap behavior observed in local density of states and ARPES spectra.
Abstract
Metal-to-insulator transitions (MIT) can be driven by a number of different mechanisms, each resulting in a different type of insulator -- Change in chemical potential can induce a transition from a metal to a band insulator; strong correlations can drive a metal into a Mott insulator with an energy gap; an Anderson transition, on the other hand, due to disorder leads to a localized insulator without a gap in the spectrum. Here we report the discovery of an alternative route for MIT driven by the creation of a network of narrow channels. Transport data on Pt substituted for Ti in TiSe shows a dramatic increase of resistivity by five orders of magnitude for few % of Pt substitution, with a power-law dependence of the temperature-dependent resistivity . Our scanning tunneling microscopy data show that Pt induces an irregular network of nanometer-thick domain walls (DWs) of…
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