Band filling and cross quantum capacitance in ion gated semiconducting transition metal dichalcogenide monolayers
Haijing Zhang, Christophe Berthod, Helmuth Berger, Thierry Giamarchi,, Alberto F. Morpurgo

TL;DR
This study investigates charge accumulation and capacitance behavior in ion-gated monolayer TMDs, revealing a significant cross quantum capacitance effect due to screening, which challenges traditional models of quantum capacitance.
Contribution
It uncovers the existence of a cross quantum capacitance in ion-gated TMD monolayers, a phenomenon previously overlooked, and provides experimental evidence for its impact on device capacitance.
Findings
Large changes in device capacitance when multiple valleys are occupied
Quantum capacitance models do not fully explain observed capacitance behavior
Screening effects lead to a cross quantum capacitance contribution
Abstract
Ionic liquid gated field-effect transistors (FETs) based on semiconducting transition metal dichalcogenides (TMDs) are used to study a rich variety of extremely interesting physical phenomena, but important aspects of how charge carriers are accumulated in these systems are not understood. We address these issues by means of a systematic experimental study of transport in monolayer MoSe and WSe as a function of magnetic field and gate voltage, exploring accumulated densities of carriers ranging from approximately 10 cm holes in the valence band to 4x10 cm electrons in the conduction band. We identify the conditions when the chemical potential enters different valleys in the monolayer band structure (the K and Q valley in the conduction band and the two spin-split K-valleys in the valence band) and find that an independent electron picture describes…
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