The true corrugation of a h-BN nanomesh layer
Luis Henrique de Lima, Thomas Greber, Matthias Muntwiler

TL;DR
This study accurately measures the true atomic corrugation and bonding distances of a hexagonal boron nitride nanomesh on rhodium using photoelectron diffraction, resolving previous discrepancies from other methods.
Contribution
It introduces a high-precision, core-sensitive photoelectron diffraction technique to determine the nanomesh's structure, providing quantitative data on corrugation and atomic buckling.
Findings
Peak-to-peak corrugation amplitude of 0.80 Å
Bonding distance to substrate of 2.20 Å
Boron and nitrogen buckling of 0.07 Å
Abstract
Hexagonal boron nitride (h-BN) nanomesh, a two-dimensional insulating monolayer, grown on the (111) surface of rhodium exhibits an intriguing hexagonal corrugation pattern with a lattice constant of 3.2 nm. Despite numerous experimental and theoretical studies no quantitative agreement has been found on some details of the adsorption geometry such as the corrugation amplitude. The issue highlights the differences in chemical and electronic environment in the strongly bound pore regions and the weakly bound wire regions of the corrugated structure. For reliable results it is important to probe the structure with a method that is intrinsically sensitive to the position of the atomic cores rather than the electron density of states. In this work, we determine the corrugation of h-BN nanomesh from angle- and energy-resolved photoelectron diffraction measurements with chemical state…
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Taxonomy
TopicsGraphene research and applications · Boron and Carbon Nanomaterials Research · Quantum and electron transport phenomena
