A model to predict image formation in the three-dimensional field ion microscope
Benjamin Klaes, Rodrigue Larde, Fabien Delaroche, Stefan Parviainen,, Nicolas Rolland, Shyam Katnagallu, Baptiste Gault, Fran\c{c}ois Vurpillot

TL;DR
This paper introduces a numerical model for simulating image formation in 3D field ion microscopy, aiding in the accurate reconstruction of atomic-scale defects in materials.
Contribution
It combines a meshless evaporation algorithm with field ionization physics to simulate imaging artifacts caused by non-regular evaporation and atomic perturbations.
Findings
Simulates imaging artifacts due to irregular evaporation.
Models impact of atomic perturbations near defects.
Enhances 3DFIM accuracy for defect analysis.
Abstract
This article presents a numerical model dedicated to the simulation of field ion microscopy (FIM). FIM was the first technique to image individual atoms on the surface of a material. By a careful control of the field evaporation of the atoms from the surface, the bulk of the material exposed, and, through a digitally processing a sequence of micrographs, a three-dimensional reconstruction can be achieved. 3DFIM is particularly suited to the direct observation of crystalline defects such as vacancies, interstitials, vacancy clusters, dislocations, and any combinations of theses defects that underpin the physical properties of materials. This makes 3DFIM extremely valuable for many material science and engineering applications, and further developing this technique is becoming crucial. The proposed model enables the simulation of imaging artefacts that are induced by non-regular field…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
