Pulsed laser deposition of single phase n- and p-type Cu2O thin films with low resistivity
Syed Farid Uddin Farhad, David Cherns, James Smith, Neil Fox, and, David Ferm\'in

TL;DR
This study demonstrates the controlled growth of single-phase n- and p-type Cu2O thin films with low resistivity using pulsed laser deposition, enabling potential applications in low-temperature Cu2O-based electronic devices.
Contribution
It introduces a method to produce phase-pure, low-resistivity Cu2O films with tunable electrical properties via oxygen partial pressure control during pulsed laser deposition.
Findings
Achieved low resistivity (~3-24 mOhm.cm) Cu2O films with tunable n- and p-type conductivity.
Demonstrated phase purity and controlled electrical properties by varying oxygen partial pressure.
Observed photovoltaic response in Cu2O-based junctions with ZnO and Si electrodes.
Abstract
Low resistivity (~3-24 mOhm.cm) with tunable n- and p-type phase pure Cu2O thin films have been grown by pulsed laser deposition at 25-200 0C by varying the background oxygen partial pressure (O2pp). Capacitance data obtained by electrochemical impedance spectroscopy was used to determine the conductivity (n- or p-type), carrier density, and flat band potentials for samples grown on indium tin oxide (ITO) at 25 0C. The Hall mobility of the n- and p-type Cu2O was estimated to be ~ 0.85 cm2.V-1s-1 and ~ 4.78 cm2.V-1s-1 respectively for samples grown on quartz substrate at 25 0C. An elevated substrate temperature ~ 200 0C with O2pp = 2 - 3 mTorr yielded p-type Cu2O films with six orders of magnitude higher resistivities in the range ~ 9 - 49 kOhm.cm and mobilities in the range ~ 13.5 - 22.2 cm2.V-1s-1. UV-Vis-NIR diffuse reflectance spectroscopy showed optical bandgaps of Cu2O films in the…
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