Global optimization of an encapsulated Si/SiO$_2$ L3 cavity for ultra-high quality factor
J.P. Vasco, V. Savona

TL;DR
This paper presents a global optimization of a silica-encapsulated silicon L3 photonic crystal cavity, achieving a record high quality factor of 4.33×10^7 and analyzing the impact of fabrication imperfections on performance.
Contribution
It introduces a novel global optimization approach for encapsulated photonic crystal cavities, setting a new record for quality factor and assessing fabrication tolerance effects.
Findings
Achieved a record quality factor of 4.33×10^7 for the cavity.
Predicted an average Q of 2 million considering fabrication imperfections.
Optimized cavity design minimizes out-of-plane losses.
Abstract
We optimize a silica-encapsulated silicon L3 photonic crystal cavity for ultra-high quality factor by means of a global optimization strategy, where the closest holes surrounding the cavity are varied to minimize out-of-plane losses. We find an optimal value of , thus setting a new record for encapsulated low-index-contrast photonic crystal cavities. We also address the effects of structural imperfections on our optimal cavity design and predict an averaged in the 2 million regime for state-of-the-art silicon fabrication tolerances.
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Taxonomy
TopicsPhotonic and Optical Devices · Photonic Crystals and Applications · Optical Network Technologies
