A realistic dimension-independent approach for charged defect calculations in semiconductors
Jin Xiao, Kaike Yang, Dan Guo, Tao Shen, Jun-Wei Luo, Shu-Shen Li,, Su-Huai Wei, and Hui-Xiong Deng

TL;DR
This paper introduces a universal, physically grounded model for calculating charged defect formation energies in semiconductors, applicable to both bulk and low-dimensional materials, overcoming limitations of the traditional jellium approach.
Contribution
A new dimension-independent model that accurately computes charged defect energies by placing electrons on host band-edge states, improving results for low-dimensional semiconductors.
Findings
Reproduces accuracy of jellium model in 3D semiconductors.
Eliminates divergence issues in low-dimensional structures.
Provides meaningful defect energies in quantum dots, nanowires, and 2D materials.
Abstract
First-principles calculations of charged defects have become a cornerstone of research in semiconductors and insulators by providing insights into their fundamental physical properties. But current standard approach using the so-called jellium model has encountered both conceptual ambiguity and computational difficulty, especially for low-dimensional semiconducting materials. In this Communication, we propose a physical, straightforward, and dimension-independent universal model to calculate the formation energies of charged defects in both three-dimensional (3D) bulk and low-dimensional semiconductors. Within this model, the ionized electrons or holes are placed on the realistic host band-edge states instead of the virtual jellium state, therefore, rendering it not only naturally keeps the supercell charge neutral, but also has clear physical meaning. This realistic model reproduces…
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