Three-dimensional imaging of beam-induced biasing of InP/GaInP tunnel diodes
Cristina Cordoba, Xulu Zeng, Daniel Wolf, Axel Lubk, Enrique, Barrig\'on, Magnus T. Borgstr\"om, and Karen L. Kavanagh

TL;DR
This study used electron holographic tomography to visualize and analyze the 3D morphology and electrostatic potential of InP/GaInP nanowire tunnel diodes, revealing effects of electron beam charging and biasing on their electrical properties.
Contribution
It provides the first 3D reconstructions of the electrostatic potential in InP/GaInP tunnel diodes and investigates beam-induced biasing effects on their electrical characteristics.
Findings
Confirmed short depletion widths (~21 nm) in both diodes.
Measured different built-in potentials (1.0 V and 0.4 V) from expected values.
Identified beam-induced charging effects affecting diode behavior.
Abstract
Electron Holographic Tomography was used to obtain 3-dimensional reconstructions of the morphology and electrostatic potential gradient of axial GaInP/InP nanowire tunnel diodes. Crystal growth was carried out in two opposite directions: GaInP:Zn/InP:S and InP:Sn/GaInP:Zn, using Zn as the p-type dopant in the GaInP, but with changes to the n-type dopant (S or Sn) in the InP. Secondary electron and electron beam induced current images obtained using scanning electron microscopy indicated the presence of p-n junctions in both cases and current-voltage characteristics measured via lithographic contacts showed the negative differential resistance, characteristic of band-to-band tunneling, for both diodes. EHT measurements confirmed a short depletion width in both cases ( nm), but different built-in potentials, , of 1.0 V for the p-type (Zn) to n-type (S) transition, and…
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