Divergence control of high-harmonic generation

TL;DR

This paper demonstrates a method to control the divergence of high-harmonic generation in the extreme ultraviolet range by adjusting the delay between fundamental and second harmonic fields, improving focus and applications.

Contribution

It introduces a novel divergence control technique using two-color laser fields that influences electron trajectories and tunnel ionization in high-harmonic generation.

Findings

Divergence minimized near photon emission maxima.

Orthogonal second harmonic affects electron trajectories.

Enhanced control over EUV beam focusing.

Abstract

We show that the divergence of extreme ultraviolet pulses from high harmonic generation, which is directly linked to the shape and size of the refocused beam, can be controlled by the relative delay between the fundamental and its intense orthogonally polarized second harmonic in two-color high-harmonic generation. We find that the divergence is minimized close to the delays were the number of emitted photons is maximized. These findings are rationalized as suppression and enhancement of long and short electron trajectories as function of the phase of the two-color laser field, respectively. The orthogonally polarized second harmonic introduces a lateral momentum component that can select one trajectory whereas it deflects the other. At the same time, the second harmonic profoundly influences the tunnel ionization process that initiates high-harmonic generation, which provides another trajectory gate. Our scheme for controlling the divergence facilitates larger numerical apertures for extreme ultraviolet microscopy. In addition, the associated reduction of the size of the focus is beneficial for extreme ultraviolet nonlinear optics and spectroscopy, as well as imaging and metrology of embedded structures.