High quality Al$_{0.37}$In$_{0.63}$N layers grown at low temperature (<300$^\circ$C) by radio-frequency sputtering
A N\'u\~nez-Cascajero, R. Blasco, S Valdueza-Felip, D. Montero, J., Olea, F. B. Naranjo

TL;DR
This study demonstrates the successful growth of high-quality Al0.37In0.63N layers at low temperatures (<300°C) using RF sputtering, maintaining structural integrity and tunable optical properties suitable for applications on various substrates.
Contribution
It introduces a low-temperature RF sputtering method for high-quality AlInN growth on diverse substrates, expanding potential applications where heating is limited.
Findings
Layers have wurtzite structure with c-axis perpendicular to substrate.
Al content remains at 37% across growth temperatures.
Optical band gap shifts from ~2.4 eV at low temperature to ~2.03 eV at 300°C.
Abstract
High-quality Al0.37In0.63N layers have been grown by reactive radio-frequency (RF) sputtering on sapphire, glass and Si (111) at low substrate temperature (from room temperature to 300{\deg}C). Their structural, chemical and optical properties are investigated as a function of the growth temperature and type of substrate. X-ray diffraction measurements reveal that all samples have a wurtzite crystallographic structure oriented with the c-axis perpendicular to the substrate surface, without parasitic orientations. The layers preserve their Al content at 37 % for the whole range of studied growth temperature. The samples grown at low temperatures (RT and 100{\deg}C) are almost fully relaxed, showing a closely-packed columnar-like morphology with an RMS surface roughness below 3 nm. The optical band gap energy estimated for layers grown at RT and 100{\deg}C on sapphire and glass substrates…
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