Hole Seeding in Level Set Topology Optimization via Density Fields
Jorge L. Barrera, Markus J. Geiss, Kurt Maute

TL;DR
This paper introduces two novel methods for hole seeding in level set topology optimization that optimize hole placement and size during the process, reducing dependency on initial patterns and computational costs.
Contribution
The paper presents two coupled density and level set field approaches for continuous hole insertion during optimization, improving robustness and efficiency over traditional seeding methods.
Findings
Reduced dependency on initial hole patterns.
Lower computational costs by minimizing interface intersections.
Effective in 2D and 3D benchmark problems.
Abstract
Two approaches that use a density field for seeding holes in level set topology optimization are proposed. In these approaches, the level set field describes the material-void interface while the density field describes the material distribution within the material phase. Both fields are optimized simultaneously by coupling them through either a single abstract design variable field or a penalty term introduced into the objective function. These approaches eliminate drawbacks of level set topology optimization methods that rely on seeding the initial design domain with a large number of holes. Instead, the proposed approaches insert holes during the optimization process where beneficial. The dependency of the optimization results on the initial hole pattern is reduced, and the computational costs are lowered by keeping the number of elements intersected by the material interface at a…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
