High Throughput Production of Transparent Conductive Single-Walled Carbon Nanotube Films via Advanced Floating Catalyst Chemical Vapor Deposition

TL;DR

This paper presents an advanced chemical vapor deposition method for large-scale production of ultrathin, high-performance single-walled carbon nanotube films with record conductivity and transparency, suitable for flexible electronics.

Contribution

The study introduces a significantly improved continuous production process for SWCNT films, achieving three orders of magnitude higher yield and record low sheet resistance at high transmittance.

Findings

Three orders of magnitude increase in yield and efficiency.

Record sheet resistance of 40 ohm/sq at 90% transmittance.

Feasible pathway for industrial-scale SWCNT TCF production.

Abstract

Single-walled carbon nanotube (SWCNT) films are promising materials for transparent conductive films (TCFs) with potential applications in flexible displays, touch screens, solar cells and solid-state lighting1,2. However, further reductions in resistivity and in cost of SWCNT films are necessary for high quality TCF products3. Here, we report an improved floating catalyst chemical vapor deposition method to directly and continuously produce ultrathin and freestanding SWCNT films at the hundred meter-scale. Both carbon conversion efficiency and SWCNT TCF yield are increased by three orders of magnitude relative to the conventional floating catalyst chemical vapor deposition. After doping, the film manifests a sheet resistance of 40 ohm/sq. at 90% transmittance, representing record performance for large-scale SWCNT films. Our work provides a new avenue to accelerate the industrialization of SWCNT films as TCFs.