Gate Voltage Control of Transition Metal Dichalcogenide Monolayers Quantum Yield
Maksym V. Strikha, Anatolii I. Kurchak, and Anna N. Morozovska

TL;DR
This paper develops a semi-phenomenological theory explaining how gate voltage influences quantum yield in 2D transition metal dichalcogenide monolayers, aligning well with experimental data and highlighting their potential in optoelectronic applications.
Contribution
It introduces an analytical model for the dependence of quantum yield on gate voltage and carrier generation in 2D-TMDs, considering various recombination mechanisms.
Findings
Analytical expressions for quantum yield dependence on gate voltage.
Quantitative agreement with experimental data.
Demonstrates gate voltage control of quantum yield in 2D-TMDs.
Abstract
Two-dimensional transition metal dichalcogenide (2D-TMD) monolayers, which reveal remarkable semiconductor properties, are the subject of active experimental research.Recently it has been shown experimentally that quantum yield in MoS2 and WSe2 monoatomic layers can reach values close to unity when electrostatic doping makes them intrinsic semiconductors. However, the available theoretical description does not give an understanding of the physical mechanisms underlying in the gate voltage control of quantum yield.This work is an attempt to propose a consistent semi-phenomenological theory of photo-induced charge carriers relaxation in 2D-TMDs, which allows obtaining an analytical dependence of the quantum yield on the voltage applied to the FET gate. We consider a standard experimental situation, when the 2D-TMD monolayer and the metal gate are plates of a flat capacitor, and the…
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