Laser-generated plasmas in length scales relevant for thin film growth and processing: simulation and experiment
Sumner B. Harris, Jacob H. Paiste, Tharon J. Holdsworth, Robert R., Arslanbekov, Renato P. Camata

TL;DR
This study combines simulations and experiments to analyze laser-generated plasmas at relevant length scales for thin film growth, providing insights into plasma properties that influence material processing, especially for 2D materials.
Contribution
It offers a quantitative model of laser-induced plasma expansion validated by experimental data, enhancing understanding of plasma behavior during thin film deposition.
Findings
Plasma composition varies with laser fluence, from Cu^0 to Cu^+ dominance.
Simulation accurately predicts plasma ionization states and energies.
High-temperature, highly ionized plasma front influences material modifications.
Abstract
In pulsed laser deposition, thin film growth is mediated by a laser-generated plasma, whose properties are critical for controlling the film microstructure. The advent of 2D materials has renewed the interest in how this ablation plasma can be used to manipulate the growth and processing of atomically thin systems. For such purpose, a quantitative understanding of the density, charge state, and kinetic energy of plasma constituents is needed at the location where they contribute to materials processes. Here we study laser-induced plasmas over expansion distances of several centimeters from the ablation target, which is the relevant length scale for materials growth and modification. The study is enabled by a fast implementation of a laser ablation/plasma expansion model using an adaptive Cartesian mesh solver. Simulation outcomes for KrF excimer laser ablation of Cu are compared with…
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