Electric field and current induced electroforming modes in NbOx
Sanjoy Kumar Nandi, Shimul Kanti Nath, Assaad El Helou, Shuai Li,, Mutsunori Uenuma, Peter E Raad, Robert G Elliman

TL;DR
This study reveals two distinct electroforming modes in NbOx films, influenced by conductivity, and correlates filament formation with electrical and thermal behaviors using innovative imaging and modeling techniques.
Contribution
It introduces a simple photoresist-based detection method to map filament distribution and links electroforming modes to film conductivity and current bifurcation phenomena.
Findings
Low conductivity films show randomly distributed filaments.
High conductivity films exhibit filament concentration and current bifurcation.
High conductivity films display S-type and snap-back negative differential resistance.
Abstract
Electroforming is used to initiate the memristive response in metal/oxide/metal devices by creating a filamentary conduction path in the oxide film. Here we use a simple photoresist-based detection technique to map the spatial distribution of conductive filaments formed in Nb/NbOx/Pt devices, and correlate these with current-voltage characteristics and in-situ thermoreflectance measurements to identify distinct modes of electroforming in low and high conductivity NbOx films. In low conductivity films the filaments are randomly distributed within the oxide film, consistent with a field-induced weakest-link mechanism, while in high conductivity films they are concentrated in the center of the film. In the latter case the current-voltage characteristics and in-situ thermoreflectance imaging show that electroforming is associated with current bifurcation into regions of low and high current…
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