Understanding Leakage Currents through $Al_2O_3$ on $SrTiO_3$
Dror Miron, Igor Krylov, Maria Baskin, Eilam Yalon, Lior Kornblum

TL;DR
This study investigates leakage currents in ALD-grown $Al_2O_3$ on $SrTiO_3$, identifying key mechanisms, effects of processing, and implications for oxide electronics and device modulation.
Contribution
It provides a detailed analysis of leakage mechanisms in $Al_2O_3$ on $SrTiO_3$, highlighting the impact of deposition and annealing on leakage behavior and analysis assumptions.
Findings
Trap-assisted tunneling and Poole-Frenkel are primary leakage mechanisms.
Annealing reduces leakage currents by eliminating traps.
Analysis sensitivity depends critically on flat-band voltage assumptions.
Abstract
Leakage currents through insulators received continuous attention for decades, owing to their importance for a wide range of technologies, and interest in their fundamental mechanisms. This work investigates the leakage currents through atomic layer deposited (ALD) , grown on . This combination is not only a key building block of oxide electronics, but also a clean system for studying the leakage mechanisms without interfacial layers that form on most of the conventional bottom electrodes. We show how tiny differences in the deposition process can have a dramatic effect on the leakage behavior. Detailed analysis of the leakage behavior rules out Fowler-Nordheim tunneling (FNT) and thermionic emission, and leaves the trap-related mechanisms of trap-assisted tunneling (TAT) and Poole-Frenkel as the likely mechanisms. After annealing the sample in air, the currents are…
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