# Enhanced low-flux sensitivity (ELFS) effect of neutron-induced displacement damage in bipolar devices: physical mechanism and parametric model

## TL;DR

This paper investigates the physical mechanism behind the enhanced low-flux sensitivity (ELFS) effect in neutron-induced damage in bipolar devices, proposing a defect cluster annealing model that accurately reproduces experimental observations.

## Contribution

A new defect cluster annealing model is developed to explain ELFS, improving understanding of neutron damage effects in bipolar devices.

## Key findings

- The model reproduces experimental ELFS behavior accurately.
- The key parameter is the ratio of Si interstitials captured by defect clusters.
- The model predicts nonsensitive regions at low and high fluxes.

## Abstract

Similar to the enhanced low-dose-rate sensitivity (ELDRS) effect of ionization damage, an enhanced low-flux senstivity (ELFS) effect has been reported in ions/neutron irradiation on n-type silicon or PNP transistors. However, the existing mechanism and simulation dominated by the diffusion dynamics give much higher transition flux than the experimental observations. In this work, we develop a new model based on the annealing of defect clusters for the ELFS effect. Simulations considering Si-interstitial-mediated inter-cluster interactions during their annealing processes successfully reproduce the ELFS effect. The ratio of Si interstitials captured by defect clusters to those dissipating off on the sample edges or re-merging into the bulk is found as the key parameter dominating the enhancement factor (EF) of the ELFS effect. We also establish a compact parametric model based on the mechanism, which is found to provide a good quantitative description of the experimental results. The model predicts the existence of nonsensitive regions at sufficiently low and high fluxes as well as a non-trivial fluence and temperature dependence of the enhancement factor.