Growth Process of Hexagonal Boron Nitride in the Diffusion and Precipitation Method Studied by X-ray Photoelectron Spectroscopy

TL;DR

This study investigates the growth and decomposition of submonolayer hexagonal boron nitride on Ni foil using X-ray photoelectron spectroscopy, revealing temperature-dependent formation and breakdown processes.

Contribution

It provides detailed insights into the temperature-dependent growth and decomposition mechanisms of h-BN on Ni via diffusion and precipitation, using XPS analysis.

Findings

h-BN formation begins at 600°C

Surface remains B-rich during growth

Decomposition occurs at 800°C

Abstract

Submonolayer h-BN was grown on Ni foil in ultra-high vacuum by the diffusion and precipitation method and the growth process was studied by x-ray photoelectron spectroscopy. Formation of h-BN started to be observed at 600 C. All through the process, the surface was always slightly B-rich, which is consistent with the fact that B which is soluble in Ni at a high temperature can diffuse in Ni by the conventional bulk diffusion and insoluble N cannot. Moreover, both formation and decomposition of h-BN were found to occur at elevated temperatures possibly depending on provision of N atoms to the surface. On the Ni surface, decomposition of h-BN was observed at a relatively low temperature of 800 C.