HiPIMS magnetized plasma afterglow diagnostic

TL;DR

This paper introduces a diagnostic method for measuring the lifetime of magnetized plasma in HiPIMS processes, aiding the optimization of thin film deposition resistant to harsh environments.

Contribution

A novel table-top system is developed to measure plasma lifetime across various HiPIMS operating conditions, including short and long pulses.

Findings

The system accurately measures plasma lifetime based on current increase.

It applies to all HiPIMS types and pulse durations.

Facilitates optimization of thin film deposition processes.

Abstract

Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it is desirable to know the lifetime of the magnetized plasma at the end of the pulsed cathode current. The table-top system we developed allows one to measure the lifetime for all operating HiPIMS types, both for short and long pulses, based on the rapid increase of the current when applying a voltage pulse with very short rise time, up to a value which depends of the initial magnetized plasma characteristics.