Fundamental mechanisms of hBN growth by MOVPE
Krzysztof Paku{\l}a, Aleksandra D\k{a}browska, Mateusz Tokarczyk,, Rafa{\l} Bo\.zek, Johannes Binder, Grzegorz Kowalski, Andrzej Wysmo{\l}ek,, and Roman St\k{e}pniewski

TL;DR
This paper investigates the fundamental growth mechanisms of hexagonal boron nitride (hBN) by MOVPE, revealing how flow modulation epitaxy (FME) enables high-quality 2D layer growth by restoring boron chemisorption at sheet edges.
Contribution
It uncovers the core growth mechanisms of hBN by MOVPE and demonstrates how FME can activate 2D growth through periodic surface reconstruction changes.
Findings
Contradicts the belief that gas-phase reactions reduce growth efficiency.
Identifies two growth mechanisms based on ammonia flow and pressure.
Shows FME enables sustained 2D growth by restoring boron chemisorption.
Abstract
Hexagonal boron nitride is a promising material for many applications ranging from deep UV emission to an ideal substrate for other two dimensional crystals. Although efforts towards the growth of wafer-scale, high quality material strongly increased in recent years, the understanding of the actual growth mechanism still remains fragmentary and premature. Here, we unveil fundamental growth mechanisms by investigating the growth of hBN by metalorganic vapor phase epitaxy (MOVPE) in a wide range of growth conditions. The obtained results contradict the widespread opinion about the importance of parasitic gas-phase reactions decreasing the growth efficiency. Two different growth mechanisms that depend on ammonia flow and reactor pressure can be distinguished. Both mechanisms are effective in the case of polycrystalline growth, but the growth of highly ordered, flat layers, is strongly…
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Taxonomy
TopicsDiamond and Carbon-based Materials Research · Graphene research and applications · Semiconductor materials and devices
