Influence of interface and microstructure on magnetization of epitaxial Fe4N thin film
Nidhi Pandey, S. Putter, S. M. Amir, V. R. Reddy, D. M. Phase, J., Stahn, Ajay Gupta, Mukul Gupta

TL;DR
This study investigates how interface quality and microstructure influence the magnetic properties of epitaxial Fe4N thin films grown on LaAlO3 substrates, highlighting the benefits of HiPIMS in reducing interdiffusion and enhancing magnetization.
Contribution
It introduces the use of HiPIMS for growing Fe4N films, demonstrating improved interface sharpness and magnetic properties compared to conventional sputtering methods.
Findings
HiPIMS yields smoother, denser Fe4N films with sharper interfaces.
Interdiffusion at the substrate-film interface reduces magnetic moment.
HiPIMS-grown films exhibit higher magnetic moments and distinct anisotropies.
Abstract
Epitaxial Fe4N thin films grown on lattice-matched LaAlO3 (LAO) substrate using sputtering and molecular beam epitaxy techniques have been studied in this work. Within the sputtering process, films were grown with conventional direct current magnetron sputtering (dcMS) and for the first time, using a high power impulse magnetron sputtering (HiPIMS) process. Surface morphology and depth profile reveal that HiPIMS deposited film has the lowest roughness, the highest packing density and the sharpest interface. La from the LAO substrate and Fe from the film interdiffuse and forms an undesired interface spreading to an extent of about 10-20 nm. In the HiPIMS process, layer by layer type growth leads to a globular microstructure which restricts the extent of the interdiffused interface. Such substrate-film interactions and microstructure play a vital role in affecting the electronic…
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Taxonomy
TopicsMagnetic properties of thin films · Magnetic and transport properties of perovskites and related materials · ZnO doping and properties
